ALD equipment was developed for an object for processes of a high gate insulator film, an organic electroluminescence passivation film (sealing film), a protection film, an oxide film and etc. An atomic-layer-deposition method is a technique known for many years, and is equipment made to deposit one atomic layer by one atomic layer.
Technology is corresponding to three-dimensional form with complicated form and the film forming to a deep slot.
It is exquisite equipment in reproducibility that enables a uniform film thickness and a film quality.
